二(三氟甲基)二硫
Bis(trifluoromethyl) disulfide | |
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别名 | 二(三氟甲基)二硫醚 |
识别 | |
CAS号 | 372-64-5 |
PubChem | 67795 |
ChemSpider | 61112 |
SMILES |
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性质 | |
化学式 | C2F6S2 |
摩尔质量 | 202.14 g·mol−1 |
外观 | 液体 |
沸点 | 34.5 °C(307.6 K)[1] |
若非注明,所有数据均出自标准状态(25 ℃,100 kPa)下。 |
二(三氟甲基)二硫(TFD)是一种二硫醚,化学式为CF3SSCF3,它曾用作熏蒸剂。[2]它是挥发性的液体,吸入剧毒,可引发严重的肺水肿。[3]
它可由二(三氯甲基)二硫和氟化钾反应[4]、三氟甲硫醇四甲基铵和碘反应[5]或三氟甲磺酰氯和三甲基膦反应[6]得到。二硫化碳、四氟化硫、氯气和氟化氢的反应也会产生二(三氟甲基)二硫,但同时会产生二(三氟甲基)三硫。[7]
参考文献
- ^ F. W. Bennett, G. R. A. Brandt, H. J. Emeléus, R. N. Haszeldine. Trifluoromethyl Derivatives of Phosphorus, Arsenic and Sulphur. Nature. 1950-08, 166 (4214): 225–225 [2021-09-14]. ISSN 0028-0836. doi:10.1038/166225a0. (原始内容存档于2021-09-14) (英语). (页面存档备份,存于互联网档案馆)
- ^ Fumigation with bis(trifluoromethyl) disulfide. [2021-09-14]. (原始内容存档于2021-09-12). (页面存档备份,存于互联网档案馆)
- ^ Progressive Pulmonary Pathology of Two Organofluorine Compounds in Rats. [2021-09-14]. (原始内容存档于2021-09-12). (页面存档备份,存于互联网档案馆)
- ^ Roman, Daniela Sustac. Bis(trifluoromethyl)disulfide. e-EROS Encyclopedia of Reagents for Organic Synthesis, 2015. 1-2. ISBN 978-0-470-84289-8.
- ^ Wieland Tyrra, Dieter Naumann, Berthold Hoge, Yurii L. Yagupolskii. A new synthesis of trifluoromethanethiolates—characterization and properties of tetramethylammonium, cesium and di(benzo-15-crown-5)cesium trifluoromethanethiolates. Journal of Fluorine Chemistry. 2003-01, 119 (1): 101–107 [2021-09-14]. doi:10.1016/S0022-1139(02)00276-2. (原始内容存档于2020-06-03) (英语). (页面存档备份,存于互联网档案馆)
- ^ Hélène Chachignon, Mayaka Maeno, Hiroya Kondo, Norio Shibata, Dominique Cahard. Novel Use of CF 3 SO 2 Cl for the Metal-Free Electrophilic Trifluoromethylthiolation. Organic Letters. 2016-05-20, 18 (10): 2467–2470 [2021-09-14]. ISSN 1523-7060. doi:10.1021/acs.orglett.6b01026 (英语).
- ^ Kunshenko, B. V.; Omarov, V. O.; Muratov, N. N.; Yagupol'skii, L. M. Reaction of organic compounds with a sulfur tetrafluoride-hydrofluoric acid-halogenating agent system. IX. Reaction of perfluoroolefins with the SF4-HF-S2Cl2 system(俄文). Zhurnal Organicheskoi Khimii, 1992. 28 (5): 892-900. ISSN 0514-7492.